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SBQMI Advanced Nanofabrication Facility (ANF)

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Nanofab status

Facility: Access and Info

Becoming a member

Equipment Status

Equipment Reservation

Wetbench SOP

Analysis

FILMETRIX F20: Thin film thickness measurement system

ZEISS: Microscope with CCD camera

DEKTAK XT: Profilometer with 3D capability and imaging

ALPHA STEP 200: Profilometer

Etching

PLASMAQUEST: ECR plasma etcher

Plasma Etch PE-50 Plasma etcher/cleaner

XACTIX: XeF2 etcher

Thin Film Deposition

TRION: PECVD & RIE

DEEWONG-2000: 4 sources electron beam evaporator

DEEDIRECTORS-2015: 8 source load-lock electron beam evaporator

AIRCO TEMESCAL: Dual 3in source RF magnetron sputter system

AJA Hybrid Evaporator System

Lithography

JEOL JBX-8100FS ELECTRON-BEAM LITHOGRAPHY SYSTEM

Heidelberg MLA-150 Maskless Lithography System

Neutronix-Quintel NxQ4006: 100mm mask aligner

Photonic Wire Bonder – Vanguard Photonics

HEADWAY PWM32 and PWM50: Photoresist spinners

LAURELL WS-400-6NPP-LITE: Photoresist spinner

CANON PLA-501F: Double Side Mask Aligner

Furnaces

KSL-1100X: Box furnace

LINDBERG: Tube furnace

MINIBRUTE: Tube furnace

HEATPULSE 210: Rapid thermal anneal (RTA) system

Lithography

AZ P4110 Process

AZ 4620 process

Silicone Rubber Micromolds (PDMS)

Thin film deposition

PECVD of SiNx and SiO2

Cleaning and wet etching

Si wafer cleaning

RCA-1 Si wafer cleaning

RCA-2 Si wafer cleaning

BOE (Buffered Oxide Etch) and HF dip

Si anisotropic etch (KOH, TMAH)

Si Isotropic etch (HNA)

Glass substrate cleaning

Glass wet etching

Gold Etch Using Potassium Iodide Solution

Plasma processes

Processing links and resources

People

Kostis Michelakis

Lukas Chrostowski

Archives

November 2019
February 2019
May 2018
April 2014
March 2013

Processes

Processing links and resources

Plasma processes

Cleaning and wet eching

Photolithography

Thin film deposition

SBQMI Advanced Nanofabrication Facility

Vancouver Campus

2355 East Mall

Vancouver, BC Canada V6T 1Z4

Tel 604 827 3228

Website www.nanofab.ubc.ca

Email anf@ampel.ubc.ca

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