Processing links and resources
Plasma processes
Cleaning and wet eching
Photolithography
Thin film deposition
Nanofab status
Equipment Status
Equipment Reservation
Wetbench SOP
Other
JEOL JBX-8100FS ELECTRON-BEAM LITHOGRAPHY SYSTEM
Heidelberg MLA-150 Maskless Lithography System
Neutronix-Quintel NxQ4006: 100mm mask aligner
Photonic Wire Bonder – Vanguard Photonics
HEADWAY PWM32 and PWM50: Photoresist spinners
LAURELL WS-400-6NPP-LITE: Photoresist spinner
CANON PLA-501F: Double Side Mask Aligner