The Nanofabrication Facility is now part of the Stewart Blusson Quantum Matter institute (SBQMI). SBQMI has invested heavily on acquiring a state-of-the-art electron-beam lithography tool (JEOL JBX-8100FS) that enables device fabrication at the nanoscale, where quantum properties of materials manifest themselves. SBQMI has also invested in a full renovation of our cleanrooms. The new cleanrooms will consist of 3 distinct rooms: (1) an ISO 5 (class 100) yellow photolithography room, equipped with both a mask aligner and a maskless lithography tool for very clean fine structures, (2) an ISO 6 (class 1000) yellow room equipped with a mask aligner and a micron scale 3D printer for photonics and microfluidic technologies and (3) an ISO 6 white room for thin film processes (deposition/etching) and metrology. These new cleanrooms will be located in the same area as the current cleanrooms but will have an area almost double the size.
Historical, and still active cleanrooms
The current cleanrooms are situated on the fourth floor of the AMPEL building, in room 446. It is a cleanroom laboratory consisting of a gowning room, a class 1000 lithography room (yellow room) and 2 class 10000 thin film rooms. The cleanrooms’ atmospheres are temperature and humidity controlled. They are situated in a larger “cocoon” laboratory which also houses the service chase and some storage cabinets. A chemical scrubber and the deionized water system are situated on a mezzanine above the cleanrooms. The cleanrooms are fully equipped for most micro- and nano-fabrication needs.
The lithography (yellow) room, a class 1000 cleanroom, houses 2 fully functional class 10 laminar flow wetbenches (total length of 3m), with equipment to spin on photoresist and do wet chemistry, 2 mask aligners (for 3 in. and 4 in. wafers) and a Nomarski microscope equipped with a CCD camera and computer capture. Also available in the yellow room is a dry clean bench, typically used for sample cleaving and preparation, and storage cabinets for the wet chemistry dishware.
The thin film room is a class 10000 cleanroom. In addition to a state of the art ECR etcher, it houses equipment for sputter, e-beam and thermal evaporation of metals and dielectrics and a Plasma Enhanced Chemical Vapor Deposition (PECVD) system for deposition of SiO2 and SiN films. It also houses 2 Rapid Thermal Annealling (RTA) ovens and a conventional dry N2 atmosphere oven. A XeF2 gas etcher is also available for Micro-Electro-Mechanical-Systems (MEMS) etching. Two travelling probe profilometers, an alpha-step and a new DEKTAK XT, as well as a Filmetrix F20 optical interference instrument are available for film thickness assessment. Finally, a wire bonder is available.
The following document contains more information: NanofabFacilityGuide