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These programmable spinners allows spinning various photoresists on wafers of various sizes. Both spinners operate the same way and thus only one SOP is presented for both.
Note that the spinner in the ISO-6 (photography) yellow room wetbench is reserved for “normal” resists whereas the big spinner in the ISO-5 yellow room wetbench is reserved for Ebeam lithography resists ZEP and PMMA.
Wetbench in ISO-5 room with 200mm Headway spinner