Photolithography

Canon alignerCANON PLA-501F: Double side 100mm mask aligner

This mask aligner is a semiautomatic system that works best with 4″ wafers.  A mask plate has to be 5″ by 5″.  The UV optics is 405 nm.

 

 

 

NxQ4000: 100 mm mask (currently single side) aligner

This mask aligner is a mostly manual system that accepts pieces as small as 7x7mm and wafers up to 100mm diameter.  It accepts mask plates 5″x5″ (125x125mm) with the main mask holder but has a holder that can accept mask plates as small as 3″x3″ (75x75mm).  It’s optics delivers both 365nm and 405nm light.  It is very easy to use for alignment.  Although expandable to allow double-side alignment, it does not currently have the adapter to allow it.

 

 

 

 

SF-100 maskless lithography tool

This equipment allows direct projection of a mask pattern onto a wafer without need of a physical mask.

 

 

 

Headway spinnerHEADWAY PWM32: Photoresist spinner

This programmable spinner allows spinning various photoresists on wafers of various sizes. The maximum size wafer that can be accommodated by this spinner is a 6″ wafer.

 

 

 

WS-400-6NPP-LITE_sLAURELL WS-400-6NPP-LITE: Photoresist spinner

This programmable spinner allows spinning of various photoresists on wafers of various sizes.  The maximum size wafer that can be accommodated by this spinner is a 6″ wafer.