Lithography

JBX-8100FS imageJEOL JBX-8100FS Electron-beam lithography system

JBX-8100FS 100kV EBL tool capable of writing features as small as 5nm on wafers up to 200mm.

 

 

 

MLA150 Heidelberg maskless lithography system

The Heidelberg MLA150 maskless lithography system allows fast direct writing of patterns as precise as 1 micron.  It can write on samples as small as 1×1 cm and up to 200 mm wafers.

 

 

 

NxQ4006: 100 mm mask (currently single side) aligner

Temporary location: Brim442

This mask aligner is a mostly manual system that accepts pieces as small as 7x7mm and wafers up to 100mm diameter.  It accepts mask plates 5″x5″ (125x125mm) with the main mask holder but has a holder that can accept mask plates as small as 3″x3″ (75x75mm).  It’s optics delivers both 365nm and 405nm light.  It is very easy to use for alignment.  Although expandable to allow double-side alignment, it does not currently have the adapter to allow it.

 

 

Vanguard Photonic Wirebonder

ISO 6 Yellow room

This tool allows 3D, 2 photon lithography. It’s main purpose is to create waveguides to mate different photonic circuits together.  The tool will be available soon.

 

 

Canon aligner

CANON PLA-501F: Double side 100mm mask aligner

In storage during cleanroom renos

This mask aligner is a semiautomatic system that works best with 4″ wafers.  A mask plate has to be 5″ by 5″.  The UV optics is 405 nm.

 

 

Headway spinnerHEADWAY PWM32: Photoresist spinner

This programmable spinner allows spinning various photoresists on wafers of various sizes. The maximum size wafer that can be accommodated by this spinner is a 6″ wafer.

 

 

 

WS-400-6NPP-LITE_sLAURELL WS-400-6NPP-LITE: Photoresist spinner

In storage during cleanroom renos

This programmable spinner allows spinning of various photoresists on wafers of various sizes.  The maximum size wafer that can be accommodated by this spinner is a 6″ wafer.

 

 

SF-100 maskless lithography tool

New home: Brim442

This equipment allows direct projection of a mask pattern onto a wafer without need of a physical mask.  It is part of the AdaMIST laboratory managed by Prof. Edmond Cretu.