Photolithography

Canon alignerCANON PLA-501F: Double side 100mm mask aligner

This maskaligner is a semiautomatic system that works best with 4″ wafers.  A mask plate has to be 5″ by 5″.  The UV optics is 405 nm.

 

 

 

NxQ4000: 150 mm mask aligner

This aligner has been purchased but has not currently been delivered and installed.

 

 

 

Headway spinnerHEADWAY PWM32: Photoresist spinner

This programmable spinner allows spinning various photoresists on wafers of various sizes. The maximum size wafer that can be accommodated by this spinner is a 6″ wafer.

 

 

 

WS-400-6NPP-LITE_sLAURELL WS-400-6NPP-LITE: Photoresist spinner

This programmable spinner allows spinning of various photoresists on wafers of various sizes.  The maximum size wafer that can be accommodated by this spinner is a 6″ wafer.