FILMETRIX F20: Thin film thickness measurement system
Temporary location: Brim442
This instrument is used to measure the thickness of transparent and semi-transparent thin films via reflection or transmission spectroscopy. Films as thin as a few tens of nm can be measured when the UV light is turned on. An SOP will be coming soon.
ZEISS: Microscope with CCD camera 
Temporary location: Brim442
This microscope can image in bright/dark fields. It can be used for simple imaging and also does Nomarski microscopy. Image capture is via a CCD camera.
DEKTAK XT: Profilometer with 3D capability
Temporary location: Brim442
This semiautomatic profilometer can be used for single and multiple scans. It provides data on a film thickness, or on a surface roughness and also allows 3D visualization of the scanned structures. It can moreover be used to measure stress of thin films.
ALPHA STEP 200: Profilometer
In storage during cleanroom renos
This profilometer provides data on a film thickness or on the surface roughness/profile of the scanned structures.