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JBX-8100FS 100kV EBL tool capable of writing features as small as 5nm on wafers up to 200mm.

JEOL JBX-81OOFS ELECTRON-BEAM LITHOGRAPHY SYSTEM

SBQMI has invested heavily on acquiring a state-of-the-art electron-beam lithography tool that enables device fabrication at the nanoscale, where quantum properties of materials manifest themselves. An intense, well formed and focused beam of electrons, scanned by precision electronics and driven by computer design data, can directly write features of a few nanometers in size on […]