Standard operating procedure Rev 01, O3/20 (beta version)
Rev. 01: Becky Lin
This tool allows 3D, 2 photon lithography. It’s main purpose is to create waveguides to mate different photonic circuits together. The tool will be available soon.
[Q] – questions
- Gather photoresists, applicator, sample into fume hood. Would the photoresist need to be scooped and placed onto a secondary carrier plate? Such as taking out the photoresist from fume hood to the optical microscope? [Q]
- Assuming using a secondary carrier plate, use a clean applicator to “scoop” out the approximate needed amount of PWB photoresist. Use a needle applicator to and drop cast PWB photoresist.
- Examine the sample with photoresist under an optical microscope.
- Take the sample and mount on the chuck of the PWB machine.
- Would the vacuum for the chuck always be on? [Q]
- Operate the PWB machine to write the PWBs. May have a machine starting procedure? [Q]
- Dismount the sample from PWB chuck and put onto a carrier and bring to fume hood.
- Take PGMEA from the chemical safety cabinet into fume hood and pour [insert amount] into a beaker. May need to dilute PGMEA? [Q]
- Put the sample into PGMEA for x amount of time at y temperature. [Q]
- Take the sample out of PGMEA and rinse with IPA. Use nitrogen gun to dry the sample
- Clean needle applicator using PGMEA and IPA as well? [Q]
- Take a second needle applicator and “scoop” out the needed amount of cladding photoresist.
- Put the sample under the optical microscope and drop cast cladding photoresist at PWB site(s).
- Dismount sample and use UV illumination to cure the cladding photoresist.
- Use PGMEA and IPA to clean the second needle applicator.
- Dispose PGMEA into the chemical waste bottle.
- Clean fume hood and working area.
- Put the PWB machine on standby? [Q]