Fee structure

The following is the fee schedule (effective May 2018)

  • A per faculty annual cap of
    • Full charges up to $20,000/yr for clean-room access and equipment fees
    • Half charges for usage exceeding $20,000/yr for clean-room access and equipment fees
  • No cap for industrial users; heavy users can contact ANF management to negotiate access

Electron-Beam Lithography using the JBX-8100FS

(NB: these charges will be revised before the end of 2018)

  • Tool usage: $70/hr academic, $450/hr industry
  • GenISys BEAMER/Tracer and JEOL/Design software:
    • Academic trained tool users: free but license only allows one user at a time
    • Industry: contact ANF management
  • Operator:
    • Free for academic use
    • $100/hr for industry

Cleanroom usage

Logging done upon entry/exit of cleanroom, on computer

  • Cleanroom access fee: $45/hr academic, $125/hr industry
  • Includes most consumables (gloves, bouffants, paper, wipes, photoresists, solvents, alcohols, common acids, developers). Except coveralls, booties, evaporation sources.
  • Process Engineer charges: $70/hr academic, $100/hr industry (not included in cap), for processing and fabrication, training, qualifying

Fee surcharges on selected equipment (NB: total equipment cost = access fee + surcharge):

  • $0/hr: wet-bench, spinner, alpha-step, microscopes
  • $10/hr: most equipment that needs a reservation (mask aligners,evaporators, wirebonder, RTA, PECVD, etchers, ovens, new thin-film profilometers)
  • $20/hr: ECR
  • $40/hr: Disco saw, CNC microdrill
  • Training and qualification on instruments is currently free of charge
  • Teaching labs: independent agreement with ANF management